AUGER-ELECTRON SPECTROSCOPY STUDIES OF INTERDIFFUSION IN ELECTRODEPOSITED AMORPHOUS NI-P ALLOYS

被引：6

作者：

BUKALUK, A

机构：

[1] Instytut Matematyki i Fizyki, Akademia Techniczno-Rolnicza, Bydgoszcz, 85-796

来源：

SURFACE AND INTERFACE ANALYSIS | 1994年 / 22卷 / 1-12期

关键词：

D O I：

10.1002/sia.740220107

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The effect of annealing on the Auger electron depth profiles of electrodeposited amorphous Ni100-(y)P(y)/Ni100-(x)P(x) (15 < x < 32 at.%, y > x) thin film couples is studied at temperatures in the range 190-280-degrees-C. Diffusion coefficients are evaluated by the means of the Boltzmann-Matano method. The composition dependence of diffusion coefficients is explained by the role of free volumes in amporphous materials on interdiffusion.

引用

页码：18 / 21

页数：4

共 23 条

[1]

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[2]

Baglin J. E. E., 1978, Thin films. Interdiffusion and reactions, P305

[3]

Brenner A, 1963, ELECTRODEPOSITION AL, V2

[4] DETERMINATION OF CONCENTRATION-DEPENDENT DIFFUSION-COEFFICIENTS IN AMORPHOUS NI-P FILMS STUDIED BY AUGER-ELECTRON DEPTH PROFILING [J].