DETERMINATION OF CONCENTRATION-DEPENDENT DIFFUSION-COEFFICIENTS IN AMORPHOUS NI-P FILMS STUDIED BY AUGER-ELECTRON DEPTH PROFILING

被引：1

作者：

BUKALUK, A

机构：

[1] Instytut Matematyki i Fizyki, Akademia Techniczno-Rolnicza, Bydgoszcz, 85-791

来源：

CZECHOSLOVAK JOURNAL OF PHYSICS | 1993年 / 43卷 / 9-10期

关键词：

D O I：

10.1007/BF01595274

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Studies of the interdiffusion in ion-plated Ni100-xPx/Ni100-yPy thin films are described. The diffusion coefficients are evaluated from depth profiles obtained by using Auger electron spectroscopy (AES). The well-known Boltzmann-Matano method is applied for extraction of the diffusion coefficients from the depth profile data. The results show a strong composition dependence.

引用

页码：887 / 891

页数：5

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