ELECTRON-BEAM-CONTROLLED DISCHARGE XECL EXCIMER LASER

被引：14

作者：

LEVATTER, JI

MORRIS, JH

LIN, SC

机构：

来源：

APPLIED PHYSICS LETTERS | 1978年 / 32卷 / 10期

关键词：

D O I：

10.1063/1.89874

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：630 / 632

页数：3

共 16 条

[1]

AKINS RP, 1978, J APPL PHYS, V49, P2365

[2] HIGH-POWER XENON FLUORIDE LASER [J].

AULT, ER ;

BRADFORD, RS ;

BHAUMIK, ML .

APPLIED PHYSICS LETTERS, 1975, 27 (07) :413-415

[3]

AULT ER, 1976, APPL PHYS LETT, V28, P23

[4] ULTRAVIOLET-PREIONIZED DISCHARGE-PUMPED LASERS IN XEF, KRF, AND ARF [J].

BURNHAM, R ;

DJEU, N .

APPLIED PHYSICS LETTERS, 1976, 29 (11) :707-709

[5]

Burnham R., COMMUNICATION

[6] 1-MUS LASER-PULSES FROM XEF [J].

CHAMPAGNE, LF ;

EDEN, JG ;

HARRIS, NW ;

DJEU, N ;

SEARLES, SK .

APPLIED PHYSICS LETTERS, 1977, 30 (03) :160-161

[7] ATTACHMENT-DOMINATED ELECTRON-BEAM-IONIZED DISCHARGES [J].

DAUGHERTY, JD ;

MANGANO, JA ;

JACOB, JH .

APPLIED PHYSICS LETTERS, 1976, 28 (10) :581-583

[8] LASER ACTION ON SIGMA-2+1-2 -] SIGMA-2+1-2 BANDS OF KRF AND XECL [J].

EWING, JJ ;

BRAU, CA .

APPLIED PHYSICS LETTERS, 1975, 27 (06) :350-352

[9] THRESHOLD POWER-DENSITY MEASUREMENTS FOR ELECTRON-BEAM SUSTAINED DISCHARGE EXCITATION OF XEF AND KRF [J].

FISHER, CH ;

CENTER, RE .

APPLIED PHYSICS LETTERS, 1977, 31 (02) :106-108

[10]

Gray D. E., 1972, AM I PHYSICS HDB, P8

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