CHEMICAL ETCHING OF SILICON .3. A TEMPERATURE STUDY IN THE ACID SYSTEM

[1] Abel E, 1928, Z PHYS CHEM-STOCH VE, V134, P279

[2] Abel E, 1928, Z PHYS CHEM-STOCH VE, V132, P55

[3] Abel E, 1928, Z PHYS CHEM-STOCH VE, V136, P135

[4] Reactivity and constitution of nitric and sulphuric acids. II. Reactivity of nitric acid in aqueous medium and in acetic medium [J]. HELVETICA CHIMICA ACTA, 1935, 18 : 368 - 375

[5] THE REACTION OF GERMANIUM WITH NITRIC ACID SOLUTIONS .1. THE DISSOLUTION REACTION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1958, 105 (09) : 487 - 496

[6] KLEIN D, COMMUNICATION

[7] MOELWYNHUGHES EA, 1947, KINETICS REACTIONS S, P370

[8] CHEMICAL ETCHING OF SILICON .2. THE SYSTEM HF, HNO3, H2O, AND HC2H3O2 [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1960, 107 (02) : 108 - 111

[9] CHEMICAL ETCHING OF SILICON .1. THE SYSTEM HF,HNO3, AND H2O [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1959, 106 (06) : 505 - 508

[10] SCHMID G, 1955, Z METALLKUNDE, V45, P128

[1] Abel E, 1928, Z PHYS CHEM-STOCH VE, V134, P279

[2] Abel E, 1928, Z PHYS CHEM-STOCH VE, V132, P55

[3] Abel E, 1928, Z PHYS CHEM-STOCH VE, V136, P135

[4] Reactivity and constitution of nitric and sulphuric acids. II. Reactivity of nitric acid in aqueous medium and in acetic medium [J]. HELVETICA CHIMICA ACTA, 1935, 18 : 368 - 375

[5] THE REACTION OF GERMANIUM WITH NITRIC ACID SOLUTIONS .1. THE DISSOLUTION REACTION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1958, 105 (09) : 487 - 496

[6] KLEIN D, COMMUNICATION

[7] MOELWYNHUGHES EA, 1947, KINETICS REACTIONS S, P370

[8] CHEMICAL ETCHING OF SILICON .2. THE SYSTEM HF, HNO3, H2O, AND HC2H3O2 [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1960, 107 (02) : 108 - 111

[9] CHEMICAL ETCHING OF SILICON .1. THE SYSTEM HF,HNO3, AND H2O [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1959, 106 (06) : 505 - 508

[10] SCHMID G, 1955, Z METALLKUNDE, V45, P128