NEGATIVE RESISTANCE IN CHROMIUM-DOPED GAAS P-I-N DIODES

被引:26
作者
SELWAY, PR
NICOLLE, WM
机构
[1] Standard Telecommunication Laboratories Ltd., Harlow, Essex
关键词
D O I
10.1063/1.1657149
中图分类号
O59 [应用物理学];
学科分类号
摘要
Gallium arsenide p-i-n diodes, made by diffusing chromium and zinc into n-type material, exhibit a stable current-controlled negative resistance at room temperature and emit recombination radiation when biased in the forward direction. The current-voltage characteristics have been measured and analysis of the results shows that the negative resistance arises as a result of the emission of light at the p-i junction, this light being reabsorbed in the semi-insulating region and causing a photoconductive effect. The electron lifetime in the chromium-diffused semi-insulating region is estimated to be about 10-8-10-7 sec and diodes with a suitable zinc diffusion have an internal efficiency for light emission of about 0.1 photons per electron. © 1969 The American Institute of Physics.
引用
收藏
页码:4087 / &
相关论文
共 18 条
[1]   DOUBLE INJECTION IN DEEP-LYING IMPURITY SEMICONDUCTORS [J].
ASHLEY, KL ;
MILNES, AG .
JOURNAL OF APPLIED PHYSICS, 1964, 35 (02) :369-&
[2]   FILAMENTARY INJECTION IN SEMI-INSULATING SILICON [J].
BARNETT, AM ;
MILNES, AG .
JOURNAL OF APPLIED PHYSICS, 1966, 37 (11) :4215-&
[3]   OBSERVATION OF CURRENT FILAMENTS IN SEMI-INSULATING GAAS [J].
BARNETT, AM ;
JENSEN, HA .
APPLIED PHYSICS LETTERS, 1968, 12 (10) :341-&
[5]  
DUMKE WP, 1964, 7 P INT C PHYS SEM, P611
[6]  
HAISTY RW, 1964, 7TH P INT C PHYS SEM, P1161
[7]   PHOTOCONDUCTIVITY AND INFRA-RED QUENCHING IN CHROMIUM-DOPED SEMI-INSULATING GALLIUM ARSENIDE [J].
HEATH, DR ;
SELWAY, PR ;
TOOKE, CC .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1968, 1 (01) :29-&
[8]  
HEATH DR, PRIVATE COMMUNICATIO
[9]   DOUBLE INJECTION DIODES AND RELATED DI PHENOMENA IN SEMICONDUCTORS [J].
HOLONYAK, N .
PROCEEDINGS OF THE INSTITUTE OF RADIO ENGINEERS, 1962, 50 (12) :2421-&
[10]   DOUBLE INJECTION IN INSULATORS [J].
LAMPERT, MA .
PHYSICAL REVIEW, 1962, 125 (01) :126-&