PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION OF HARD COATINGS WITH METALLOORGANIC COMPOUNDS

被引：33

作者：

RIE, KT

GEBAUER, A

机构：

[1] Institut für Oberflächentechnik und plasmatechnische Werkstoffentwicklung, Technische Universität Braunschweig, W-3300 Braunschweig

来源：

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 1991年 / 139卷 / 1-2期

关键词：

539 Metals Corrosion and Protection; Metal Plating - 545 Iron and Steel - 741 Light; Optics and Optical Devices - 804 Chemical Products Generally - 813 Coatings; Finishes and Thin Film Deposition - 932 High Energy Physics; Nuclear Physics; Plasma Physics;

D O I：

10.1016/0921-5093(91)90597-G

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

In this work the use of two metallo-organic compounds, titanium tetrakisdialylamides, was investigated with a pulsed d.c. plasma-assisted chemical vapour deposition process to deposit layers on steel substrates and hard metals. The layers have been studied by scanning electron microscopy X-ray diffraction and wavelength-dispersive X-ray analysis. It is shown that chlorine-free titanium carbonitride coatings can be obtained by metallo-organic chemical vapour deposition even at substrate temperatures of lower than 450-degrees-C.

引用

页码：61 / 66

页数：6

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