THE ELECTROSTATIC NATURE OF CONTAMINATIVE PARTICLES IN A SEMICONDUCTOR PROCESSING PLASMA

被引:36
作者
NOWLIN, RN
CARLILE, RN
机构
[1] Department of Electrical and Computer Engineering, The University of Arizona, Tucson
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1991年 / 9卷 / 05期
关键词
D O I
10.1116/1.577208
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Two models are presented to describe the immediate environment surrounding negatively charged contaminants in an idealized argon plasma. The first model uses Poisson's equation to determine the contaminant charge and voltage. This model predicts a critical radius of the order of the Debye length below which Poisson's equation is no longer valid. Below the critical radius and for contaminant radii much less than the Debye length, the Coulomb potential is used to find the contaminant charge and voltage. Both models predict negative charges on the order of 10(-14) C, and voltages on the same order of magnitude as the electron energy.
引用
收藏
页码:2825 / 2883
页数:59
相关论文
共 9 条
[1]   THEORY OF ELECTROSTATIC PROBES IN A LOW-DENSITY PLASMA [J].
BERNSTEIN, IB ;
RABINOWITZ, IN .
PHYSICS OF FLUIDS, 1959, 2 (02) :112-121
[2]  
KREYSZIG E, 1983, ADV ENG MATH, P842
[3]   ELECTRON-TRANSPORT COEFFICIENTS IN DUSTY ARGON PLASMAS [J].
MCCAUGHEY, MJ ;
KUSHNER, MJ .
APPLIED PHYSICS LETTERS, 1989, 55 (10) :951-953
[4]  
MERRIAM J, 1986, DYNAMICS, V2, P209
[5]  
SELWYN G, IN PRESS
[6]   INSITU PLASMA CONTAMINATION MEASUREMENTS BY HENE LASER-LIGHT SCATTERING - A CASE-STUDY [J].
SELWYN, GS ;
MCKILLOP, JS ;
HALLER, KL ;
WU, JJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (03) :1726-1731
[7]   INSITU LASER DIAGNOSTIC STUDIES OF PLASMA-GENERATED PARTICULATE CONTAMINATION [J].
SELWYN, GS ;
SINGH, J ;
BENNETT, RS .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (04) :2758-2765
[8]  
SWIFT J, 1970, ELECTRICAL PROBES PL, P41
[9]  
TRULSEN J, COMMUNICATION