CHARACTERIZATION OF PLASMA-DEPOSITED AMORPHOUS HYDROGENATED CARBON-FILMS BY NEUTRON REFLECTIVITY

被引：11

作者：

GRUNDY, MJ

RICHARDSON, RM

ROSER, SJ

BEAMSON, G

BRENNAN, WJ

HOWARD, J

ONEIL, M

PENFOLD, J

SHACKLETON, C

WARD, RC

机构：

[1] UNIV BRISTOL,DEPT PHYS CHEM,BRISTOL BS8 1TS,AVON,ENGLAND

[2] ICI PLC,WILTON MAT RES CTR,MIDDLESBOROUGH TS6 8JE,CLEVELAND,ENGLAND

[3] ISIS,RUTHERFORD APPLETON LAB,DIDCOT OX11 0JY,OXON,ENGLAND

来源：

THIN SOLID FILMS | 1989年 / 172卷 / 02期

关键词：

Films--Radiation Effects - Neutrons--Reflection - Plasma Devices - Silicon and Alloys--Substrates;

D O I：

10.1016/0040-6090(89)90654-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Thin films (less than 2000 angstrom) of amorphous hydrogenated carbon have been characterized by neutron reflectivity measurements. Films were deposited onto silicon substrates from a methane r.f. plasma to produce both very hard and very soft materials. The critical angle and density give the film composition (CH0.55±0.05 hard film, CH0.78±0.08 soft film). Fitting the interference pattern to a model gives the film thickness and a measure of the extent of mixing at the silicon-carbon interface. A structural model for plasma-deposited carbon films is used to correlate film composition with plasma deposition conditions and optical band gap measurements.

引用

页码：269 / 282

页数：14

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