DIFFUSION OF ION-IMPLANTED KR-85 IN KCL, INCLUDING EFFECTS OF CHANNELING, RADIATION-DAMAGE, AND DIVALENT DOPING

被引：3

作者：

PRONKO, PP

KELLY, R

机构：

来源：

JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS | 1972年 / 33卷 / 09期

关键词：

D O I：

10.1016/S0022-3697(72)80470-0

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

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页码：1761 / &

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