ADSORPTION AND DESORPTION OF CF3I ON RU(001)

被引:23
作者
DYER, JS
THIEL, PA
机构
[1] IOWA STATE UNIV SCI & TECHNOL,AMES LAB,AMES,IA 50011
[2] IOWA STATE UNIV SCI & TECHNOL,DEPT CHEM,AMES,IA 50011
关键词
D O I
10.1016/0039-6028(90)90074-I
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We have studied the interaction of CF3I with Ru(001). Adsorption at 100 K is followed by desorption, at higher temperatures, of molecular cf3I, atomic iodine, atomic fluorine, CF2 and CF3 fragments, and a small amount of CF4. The identification of these gases is based on fragmentation patterns, and (in the case of the CF2 and CF3, particles) on the characteristics of accompanying CO. This product distribution indicates that C-I and C-F bonds break. The order of appearance of the dissociative products, with increasing exposure, is: monatomic species < CF2; < CF3 < CF4. We favor a dissociative-site-blocking model to explain this sequential population Finally, CF2 and CF3, desorb at much higher temperatures than polyatomic fragments observed in previous surface studies of halomethanes, suggesting that they are produced by a different mechanism. © 1990.
引用
收藏
页码:169 / 179
页数:11
相关论文
共 44 条
[1]  
[Anonymous], 1962, VACUUM
[2]   STRUCTURE AND ENERGETICS OF SIMPLE CARBENES CH2, CHF, CHCL, CHBR, CF2, AND CCL2 [J].
BAUSCHLICHER, CW ;
SCHAEFER, HF ;
BAGUS, PS .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1977, 99 (22) :7106-7110
[3]   DESORPTION OF HALOGENS FROM SOME NB, MO, TA AND W SINGLE-CRYSTAL SURFACES [J].
BOLBACH, G ;
BLAIS, JC .
SURFACE SCIENCE, 1984, 137 (01) :327-338
[4]  
CANTERFORD JH, 1968, HALIDES 2ND 3RD ROW
[5]  
CARRE DJ, 1986, ASLE TRANS, V29, P121
[6]   REACTION OF ATOMICALLY CLEAN ALUMINUM AND CHEMICALLY MODIFIED ALUMINUM WITH ALKYL-HALIDES [J].
CHEN, JG ;
BEEBE, TP ;
CROWELL, JE ;
YATES, JT .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1987, 109 (06) :1726-1729
[7]   F2 ADSORPTION ON SI OBSERVED WITH SIMS AND QCM [J].
COBURN, JW ;
KNABBE, EA ;
KAY, E .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03) :480-483
[8]  
DAVIS LE, 1972, HDB AUGER ELECTRON S
[9]   FLUORINE DETECTION SENSITIVITY IN ELECTRON-STIMULATED DESORPTION [J].
DEMORAES, M ;
LICHTMAN, D .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (04) :1595-1596
[10]   UNIMOLECULAR DECAY OF CF4+ AND CCL4+ [J].
DEUTSCH, H ;
LEITER, K ;
MARK, TD .
INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1985, 67 (02) :191-197