PROGRESS IN SOLIDS ANALYSIS BY SPUTTERED NEUTRAL MASS-SPECTROMETRY

被引：6

作者：

GANSCHOW, O ^{[1
]}

JEDE, R ^{[1
]}

KAISER, U ^{[1
]}

机构：

[1] LEYBOLD AG,W-5000 COLOGNE 51,GERMANY

来源：

VACUUM | 1990年 / 41卷 / 7-9期

关键词：

D O I：

10.1016/0042-207X(90)94046-S

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Sputtered neutral mass spectrometry using electron impact postionization has become a routinely used thin film analysis tool. We discuss its specific application areas in quantitative analysis interface analysis, extended depth range and high depth resolution profiling, analysis of insulators along with its quantitation aspects and expected future trends.

引用

页码：1654 / 1660

页数：7

共 36 条

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