FABRICATION OF CERAMIC COATINGS BY IMPROVED PLASMA CHEMICAL VAPOR-DEPOSITION

被引：6

作者：

KAWAI, H

UKEGAWA, H

YOSHIOKA, T

DOI, A

机构：

[1] Itami Laboratory, Sumitomo Electric Industries Ltd., Itami, Hyogo, 664

来源：

SURFACE & COATINGS TECHNOLOGY | 1992年 / 50卷 / 02期

关键词：

D O I：

10.1016/0257-8972(92)90047-E

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A triode plasma chemical vapour deposition (CVD) technique has been recently developed. A grid electrode was added to our unique diode plasma CVD apparatus which was developed and produced on the basis of the CVD method. The triode system produced TiN and Al2O3 films deposited at low temperatures (773-873 K) with adhesion equivalent to or better than that of ion plated films. The films were coated onto cemented carbide inserts to evaluate their cutting performance, with results showing excellent properties.

引用

页码：85 / 88

页数：4