EMBOSSED GRATINGS IN SOL-GEL WAVE-GUIDES - PRE-EMBOSS HEAT-TREATMENT EFFECTS

被引:26
作者
RONCONE, RL
WELLERBROPHY, LA
WEISENBACH, L
ZELINSKI, BJJ
机构
[1] THREE M CO, CORP RES LABS, ST PAUL, MN 55144 USA
[2] UNIV ARIZONA, DEPT MAT SCI & ENGN, TUCSON, AZ 85721 USA
关键词
D O I
10.1016/0022-3093(91)90502-W
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
An embossing technique is used to fabricate surface-relief gratings into SiO2-TiO2 dielectric, step-index, planar optical waveguides, fabricated using a sol-gel process. The influence that a pre-emboss bake cycle has upon the embossibility of the SiO2-TiO2 sol-gel films is described. Through SEM evaluation, the embossed grating ruling profile and general appearance are shown to be strongly dependent upon the duration of the bake at 70-degrees-C. In addition, two embossing surface mechanisms, molding and stress-induced fracturing, are identified and correlated with the duration of the pre-emboss bake. Embossed waveguide gratings with a 0.52-mu-m period and 100-200 nm peak-to-trough depth were fabricated.
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页码:111 / 117
页数:7
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