LOCAL-STRUCTURE DETERMINATION FOR SURFACE CHLORINATION WITH EELFS

In this paper the results of an investigation of the local structure of a layer of molecular chlorine condensed on Si(100) at T = 110 K and an unbroken AgCl film evaporated on Ag(111) at T = 160 K are presented. It was found that the nearest neighbor Cl-Ag distance in the AgCl film of 2.75 +/- 0.05 Angstrom is in good agreement with bulk values (2.77 Angstrom). The Cl-Cl distance of 2.00 +/- 0.05 Angstrom in a chlorine film condensed on Si(100) is also close to the bulk value (1.98 Angstrom).