LOCAL-STRUCTURE DETERMINATION FOR SURFACE CHLORINATION WITH EELFS

被引:3
作者
ANDRYUSHECHKIN, BV
ELTSOV, KN
SHEVLYUGA, VM
机构
[1] Chemical Laboratory, General Physics Institute Russian Academy of Sciences, 117942 Moscow
来源
PHYSICA B | 1995年 / 208卷 / 1-4期
关键词
D O I
10.1016/0921-4526(94)00725-B
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
In this paper the results of an investigation of the local structure of a layer of molecular chlorine condensed on Si(100) at T = 110 K and an unbroken AgCl film evaporated on Ag(111) at T = 160 K are presented. It was found that the nearest neighbor Cl-Ag distance in the AgCl film of 2.75 +/- 0.05 Angstrom is in good agreement with bulk values (2.77 Angstrom). The Cl-Cl distance of 2.00 +/- 0.05 Angstrom in a chlorine film condensed on Si(100) is also close to the bulk value (1.98 Angstrom).
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页码:471 / 473
页数:3
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