ANGULAR VARIATION OF SPUTTER YIELD PEAK FOR SILICA GLASS TARGETS

被引：6

作者：

WITCOMB, MJ ^{[1
]}

机构：

[1] UNIV WITWATERSRAND,ELECTR MICROSCOPE UNIT,JOHANNESBURG 2001,SOUTH AFRICA

来源：

JOURNAL OF APPLIED PHYSICS | 1977年 / 48卷 / 01期

关键词：

D O I：

10.1063/1.323352

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：434 / 436

页数：3

共 31 条

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