FORMATION OF PRECIPITATE PHASES IN ALUMINIUM BY ION IMPLANTATION

被引：61

作者：

THACKERY, PA

NELSON, RS

机构：

[1] Metallurgy Division, U.K.A.E.A. Research Group, Atomic Energy Research Establishment, Harwell

来源：

PHILOSOPHICAL MAGAZINE | 1969年 / 19卷 / 157期

关键词：

D O I：

10.1080/14786436908217771

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The formation of precipitates of second phases during the ion implantation of thin metallic films is discussed in general terms. Observations from an electron microscope investigation of precipitation behaviour during the implantation of aluminium specimens with 70-80 kev Cu+, Sb+ and Pb+ ions are described in detail. Special reference is made to the effects of radiation-enhanced diffusion and surface sputtering on precipitate growth and distribution, and to the morphology and orientation relationships of the precipitates concerned, which include CuAl2 and AlSb, and Pb in both solid and liquid states. © 1969 Taylor & Francis Group, LLC.

引用

页码：169 / &

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