DIFFUSION LAYER INTERPRETATION OF INTERACTION OF ELECTROREFINING ADDITION AGENTS

被引:10
作者
JENNINGS, HS
RIZZO, FE
机构
[1] USA, TROPIC TEST CTR, COCO SOLO, PANAMA
[2] UNIV TEXAS, DEPT MET ENGN, EL PASO, TX 79968 USA
来源
METALLURGICAL TRANSACTIONS | 1973年 / 4卷 / 04期
关键词
D O I
10.1007/BF02645590
中图分类号
TF [冶金工业];
学科分类号
0806 ;
摘要
引用
收藏
页码:921 / 926
页数:6
相关论文
共 14 条
[2]   MECHANISM OF ELECTRODEPOSITION AND DISSOLUTION PROCESSES OF COPPER IN AQUEOUS SOLUTIONS [J].
BOCKRIS, JO ;
ENYO, M .
TRANSACTIONS OF THE FARADAY SOCIETY, 1962, 58 (474) :1187-&
[3]  
BUTTS A, 1954, COPPER SCIENCE TECHN
[4]  
BYALLOZOR SG, 1968, SOV ELECTROCHEM, V4, P521
[5]  
FARRELL MA, 1966, PLATING, V64, P1110
[6]   THE MECHANISM OF THE REACTION AT A CU/CU-2+ ELECTRODE [J].
HILLSON, PJ .
TRANSACTIONS OF THE FARADAY SOCIETY, 1954, 50 (04) :385-393
[7]   ELECTRODE KINETIC PARAMETERS FOR COPPER DEPOSITION ON CLEAN AND SOILED COPPER CATHODES [J].
KARASYK, L ;
LINFORD, HB .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (08) :895-904
[9]  
LYZLOV YV, 1957, ZH FIZ KHIM+, V31, P2720
[10]  
MAIRANOVSKII SG, 1965, SOV ELECTROCHEM, V1, P1128