CRYSTAL GROWTH AND ORIENTATIONS IN VACUUM-CONDENSED SILVER FILMS AND THEIR SYSTEMATIC DEPENDANCE ON RESIDUAL AIR PRESSURE, FILM THICKNESS, RATE OF DEPOSITION AND SUBSTRATE TEMPERATURE

被引：34

作者：

DUTTA, PK

WILMAN, H

机构：

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1970年 / 3卷 / 06期

关键词：

D O I：

10.1088/0022-3727/3/6/303

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：839 / &

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