GIANT MAGNETORESISTANCE IN SPUTTERED CO-AG ALLOY THIN-FILMS

被引：26

作者：

BARNARD, JA

HOSSAIN, S

PARKER, MR

WAKNIS, A

WATSON, ML

机构：

[1] Center for Materials for Information Technology, University of Alabama, Tuscaloosa

来源：

JOURNAL OF APPLIED PHYSICS | 1993年 / 73卷 / 10期

关键词：

D O I：

10.1063/1.352654

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

''Giant'' magnetoresistance ratios have been measured at room temperature in single layer Co-Ag alloy thin film. The effect has been observed over a broad range of Co concentrations with a maximum as-deposited MR ratio of > 22% (at x = 0.38). The effects of two annealing sequences have also been studied. The MR ratio generally increases on annealing reaching a maximum of approximately 28% (at x = 0.38) after the second anneal.

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收藏

页码：6372 / 6374

页数：3

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