APPLICATION OF ION MICROPROBE ANALYZER TO MEASUREMENT OF DISTRIBUTION OF BORON IONS IMPLANTED INTO SILICON CRYSTALS

被引：40

作者：

GITTINS, RP

DEARNALEY, G

MORGAN, DV

机构：

来源：

关键词：

D O I：

10.1088/0022-3727/5/9/321

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1654 / +

页数：1

共 21 条

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[9] RANGE OF IMPLANTED BORON, PHOSPHORUS, AND ARSENIC IN SILICON
DAVIES, DE
[J]. CANADIAN JOURNAL OF PHYSICS, 1969, 47 (16) : 1750 - &
[10] Eisen F. H., 1970, Atomic collision phenomena in solids, P111