EFFECTIVE MASSES AND SUM-RULES IN STRAINED SI/GE STRUCTURES

被引:9
作者
GELL, M
机构
[1] Materials Division, British Telecommunications Research Laboratories, Martlesham Heath, Ipswich IP5 7RE, Suffolk
来源
PHYSICAL REVIEW B | 1990年 / 41卷 / 11期
关键词
D O I
10.1103/PhysRevB.41.7611
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Valence-band effective masses in strained Si/Ge semiconductor structures have been calculated using empirical pseudopotentials with spin-orbit coupling. By separating different terms within the effective-mass sum rule, it is shown explicitly that numerous couplings via the momentum operator between orbital components across the fundamental band gap play a crucial role in establishing the strained-layer effective masses. The neglect of these matrix element effects, involving conduction states lying within about 8 eV from the band edge, can lead to significant errors in determining the valence-band effective masses. These results indicate the necessity for a reappraisal of the formulation of effective-mass-type models employing a limited number of bands as applied to strained-layer heterosystems because the important couplings are not just those between states lying close to the band edges. © 1990 The American Physical Society.
引用
收藏
页码:7611 / 7614
页数:4
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