DEPOSITION OF CARBON ON GOLD USING SYNCHROTRON RADIATION

被引:45
作者
ROSENBERG, RA [1 ]
MANCINI, DC [1 ]
机构
[1] UNIV WISCONSIN,MAT SCI PROGRAM,MADISON,WI 53706
基金
美国国家科学基金会;
关键词
D O I
10.1016/0168-9002(90)90041-4
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Carbon contamination on the surfaces of optical components in beamlines is known to cause severe loss of flux, particularly for photon energies above the C K edge (∼ 280 eV). In order to gain insight into the mechanisms by which carbon deposition occurs we have used focussed, broadband synchrotron radiation (SR) to deposit carbon on gold under controlled conditions. Carbon was deposited by photolysis of various gases at pressures in the range of 10-8 to 10-6 Torr. Deposition was found to be localized to the area where the SR was incident on the surface. The relative concentration of carbon was monitored using Auger electron spectroscopy. The rate of deposition was found to be proportional to pressure and inversely proportional to substrate temperature. Effects of gas composition were also studied. Of the seven gases examined, acetone and methyl methacrylate had the highest deposition rate, while ethylene had the lowest. The ramifications of these findings on carbon contamination of beamline optical components are discussed. © 1990.
引用
收藏
页码:101 / 106
页数:6
相关论文
共 15 条
  • [1] INVESTIGATION OF CARBON CONTAMINATION OF MIRROR SURFACES EXPOSED TO SYNCHROTRON RADIATION
    BOLLER, K
    HAELBICH, RP
    HOGREFE, H
    JARK, W
    KUNZ, C
    [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 208 (1-3): : 273 - 279
  • [2] CHRISTOPHOROU LG, 1984, ELECTRON MOL INTERAC, V1, P477
  • [3] HALLER I, 1973, J PHYS CHEM-US, V67, P1784
  • [4] Photochemical studies XXIII The photochemical decomposition of acetone vapor near 1900 angstrom - A comparison with the decomposition at longer wave lengths
    Howe, JP
    Noyes, WA
    [J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1936, 58 : 1404 - 1412
  • [5] LIN LJT, 1972, J PHOTOCHEM, V1, P453
  • [6] SUMMARY ABSTRACT - PHOTOABLATION OF PHOTORESIST POLYMER THIN-FILMS USING SYNCHROTRON RADIATION
    MANCINI, DC
    TAYLOR, JW
    BEALL, CE
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (01): : 461 - 462
  • [7] INSULATOR THIN FILMS FORMED BY GLOW DISCHARGE AND RADIATION TECHNIQUES
    MEARNS, AM
    [J]. THIN SOLID FILMS, 1969, 3 (03) : 201 - &
  • [8] Noyes W.A., 1941, PHOTOCHEMISTRY GASES
  • [9] NEW SYNCHROTRON RADIATION CENTER BEAMLINES AT ALADDIN
    PRUETT, CH
    BRODSKY, EL
    COLE, RK
    CROSSLEY, SL
    CROSSLEY, DB
    HANSEN, RWC
    NELSON, T
    PERKINS, FK
    ROGERS, GC
    ROSENBERG, RA
    WALLACE, DJ
    WINTER, WR
    MIDDLETON, FH
    FILIPPONI, A
    ZANINI, F
    [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1989, 60 (07) : 1913 - 1916
  • [10] POLARIZATION-DEPENDENT C(K) NEAR-EDGE X-RAY-ABSORPTION FINE-STRUCTURE OF GRAPHITE
    ROSENBERG, RA
    LOVE, PJ
    REHN, V
    [J]. PHYSICAL REVIEW B, 1986, 33 (06): : 4034 - 4037