INFLUENCE OF COMPOSITION AND PROCESS PARAMETERS ON THE INTERNAL-STRESS OF THE CARBIDES OF TUNGSTEN, CHROMIUM, AND TITANIUM

被引:28
作者
BERGMANN, E
VOGEL, J
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 01期
关键词
D O I
10.1116/1.574140
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
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页码:70 / 74
页数:5
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共 35 条
[1]   MECHANISMS OF VOLTAGE-CONTROLLED, REACTIVE, PLANAR MAGNETRON SPUTTERING OF AL IN AR-N2 AND AR-O2 ATMOSPHERES [J].
AFFINITO, J ;
PARSONS, RR .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1984, 2 (03) :1275-1284
[2]   CHEMICAL VAPOR-DEPOSITED TUNGSTEN CARBIDE WEAR-RESISTANT COATINGS FORMED AT LOW-TEMPERATURES [J].
ARCHER, NJ ;
YEE, KK .
WEAR, 1978, 48 (02) :237-250
[3]  
BERGMANN E, 1985, 1ST P INT C SURF ENG
[4]  
BERGMANN E, UNPUB
[5]   MICROHARDNESS AND STRUCTURE OF REACTIVE ION-PLATED CHROMIUM-CARBON FILMS [J].
BEWILOGUA, K ;
BUGIEL, E ;
RAU, B ;
SCHURER, C ;
WEISSMANTEL, C .
KRISTALL UND TECHNIK-CRYSTAL RESEARCH AND TECHNOLOGY, 1980, 15 (10) :1205-1212
[6]  
BUNSHAH RF, 1972, J VAC SCI TECHNOL, V9, P385
[7]  
BUNSHAH RF, Patent No. 2330545
[8]   CHARACTERIZATION AND WEAR-RESISTANCE OF COATINGS IN THE CR-C-N TERNARY-SYSTEM DEPOSITED BY PHYSICAL VAPOR-DEPOSITION [J].
CHOLVY, G ;
DEREP, JL ;
GANTOIS, M .
THIN SOLID FILMS, 1985, 126 (1-2) :51-60
[9]  
Dimigen H., 1983, Philips Technical Review, V41, P186
[10]  
DIMIGEN H, 1983, VERSCHLEISS KORROSIO, V20, P257