Slot antenna 2.45 GHz microwave plasma source

被引:129
作者
Werner, F. [1 ]
Korzec, D. [1 ]
Engemann, J. [1 ]
机构
[1] Univ Wupperlal, Microstruct Res Ctr Fmt, D-42287 Wuppertal, Germany
关键词
D O I
10.1088/0963-0252/3/4/004
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
A new large-volume microwave plasma source of interest for technological applications has been developed. An annular waveguide resonator with axial slots on its inner side acts as a field applicator to sustain a plasma at 2.45 GHz in a fused silica cylinder of 16 cm in diameter and 49 cm in length. The distance between slots is equal to a waveguide wave length. The slot antenna (SLAN) extends axially for about 9 cm. The plasma fills the tube axially as a result of surface wave propagation at the plasma-fused silica interface. The geometrical properties of the source were optimized by use of a numerical code allowing calculation of electric and magnetic fields inside the slot antenna. The calculated field patterns fit perfectly to those collected by use of a small loop antenna inside the SLAN without a plasma A long time stable operation of the plasma source for pressure range from 0.01 to 1 mbar and Dower range from 50 to 1200 W was achieved. Argon plasma was characterized by use of a double Langmuir probe. Typical results are an ion density of 12 x 10(12) cm(-3) and an electron temperature of 1.2 eV x 11604 K eV(-1) for a microwave power of 1.2 kW and a gas press-re of 1 mbar. The worst case azimuthal variation of the ion density for high pressure (1 mbar) does not exceed 25%. For low pressure (0.01 mbar) me azimuthal homogeneity is better than 5%.
引用
收藏
页码:473 / 481
页数:9
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