Processing, Characterization, and Potential Applications of YBa2Cu3O7/Au YBa2Cu3O7/Au/Si Superconducting Thin Films Fabricated by Rapid Isothermal Processing Assisted Metalorganic Chemical Vapor Deposition

For many device applications, it is desirable to grow thin films of high temperature superconductors on conducting substrates. Metalorganic chemical vapor deposition (MOCVD) is considered as an ideal technique for the deposition of high temperature superconducting thin films and related materials. Rapid isothermal processing (RIP) based on incoherent radiation as the sources of light is emerging as a low thermal budget (integral of processing time and temperature) processing technique. We have used RIP assisted MOCVD for the deposition of high quality films of YBa2Cu3O7 (YBCO) on insulating substrates at temperature as low as 610 degrees C. We report the results of processing and characterization of YBCO films deposited on bulk gold foils and Au/Si substrates by RIP assisted MOCVD. By using the YBCO/Au foils, we show improvement in the performance of Au/YBCO/n-Si Schottky diodes operating at 50 K.