IR, ELECTRON-SPIN-RESONANCE AND RESISTIVITY MEASUREMENTS ON AMORPHOUS-SILICON OXI-NITRIDE FILMS PREPARED BY PECVD AT LOW-TEMPERATURE

被引：13

作者：

CROS, Y

JOUSSE, D

LIU, J

ROSTAING, JC

机构：

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1987年 / 90卷 / 1-3期

关键词：

D O I：

10.1016/S0022-3093(87)80428-3

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：287 / 290

页数：4

共 8 条

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