XPS, ELECTRON-SPIN-RESONANCE AND RESISTIVITY MEASUREMENTS ON AMORPHOUS-SILICON OXYNITRIDE FILMS (A-SIOXNY) PREPARED BY REACTIVE EVAPORATION OF SI IN PRESENCE OF NO2

被引：28

作者：

KUBLER, L

HAUG, R

RINGEISEN, F

JAEGLE, A

机构：

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1983年 / 54卷 / 1-2期

关键词：

D O I：

10.1016/0022-3093(83)90080-7

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

收藏

页码：27 / 42

页数：16

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