OPTICAL PLASMA MONITORING OF Y-BA-CU-O RF SPUTTER TARGET TRANSIENTS

被引：16

作者：

KLEIN, JD

YEN, A

机构：

来源：

APPLIED PHYSICS LETTERS | 1989年 / 55卷 / 25期

关键词：

D O I：

10.1063/1.102368

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：2670 / 2672

页数：3

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[1] REAL-TIME MONITORING OF LASER ABLATION DEPOSITION OF SUPERCONDUCTORS BY FLUORESCENCE AND SECONDARY-ION SPECTRA
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[7] TARGET PRESPUTTERING EFFECTS ON STOICHIOMETRY AND DEPOSITION RATE OF Y-BA-CU-O THIN-FILMS GROWN BY DC MAGNETRON SPUTTERING
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[8] ANNEALING STUDIES OF YBA2CU3O7-X THIN-FILMS
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[J]. APPLIED PHYSICS LETTERS, 1988, 53 (07) : 612 - 614
[9] SUPERCONDUCTIVITY AND RESPUTTERING EFFECTS IN RF-SPUTTERED YBA2CU3O7-X THIN-FILMS
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[J]. APPLIED PHYSICS LETTERS, 1987, 51 (25) : 2146 - 2148
[10] PLASMA EMISSION FROM LASER ABLATION OF THE HIGH-TEMPERATURE SUPERCONDUCTOR YBA2CU3O7
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[J]. APPLIED PHYSICS LETTERS, 1988, 52 (25) : 2171 - 2173