FACTORS INFLUENCING THE STABILITY OF A SECONDARY ELECTRON MONITOR

被引：11

作者：

ISABELLE, DB

ROY, PH

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS | 1963年 / 20卷 / JAN期

关键词：

D O I：

10.1016/0029-554X(63)90381-1

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：17 / 20

页数：4

共 9 条

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[9] SECONDARY EMISSION BEAM MONITORS FOR 0.5 TO 3.5 MEV ELECTRONS [J].

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