MICROPATTERNING OF SURFACES BY EXCIMER LASER PROJECTION

[1] [Anonymous], 1974, OPTICS

[2] ASHBY CIH, 1987, PHYS THIN FILMS, V13, P151

[3] A SIMPLE-MODEL FOR PREDICTING CONTRAST IN PHOTORESISTS [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1985, 32 (09) : 1896 - 1898

[4] BAUERLE D, 1986, CHEM PROCESSING LASE

[5] BAUERLE D, 1988, P MATERIALS RES S, V101, P411

[6] BORN E, 1980, PRINCIPLES OPTICS, P186

[7] BRANNON J, 1988, P MATERIALS RES SOC, V101, P27

[8] BRANNON J, UNPUB

[9] GLASS ETCHING INITIATED BY EXCIMER LASER PHOTOLYSIS OF CF2BR2 [J]. JOURNAL OF PHYSICAL CHEMISTRY, 1986, 90 (09) : 1784 - 1789

[10] EXCIMER LASER ETCHING OF POLYIMIDE [J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (05) : 2036 - 2043

[1] [Anonymous], 1974, OPTICS

[2] ASHBY CIH, 1987, PHYS THIN FILMS, V13, P151

[3] A SIMPLE-MODEL FOR PREDICTING CONTRAST IN PHOTORESISTS [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1985, 32 (09) : 1896 - 1898

[4] BAUERLE D, 1986, CHEM PROCESSING LASE

[5] BAUERLE D, 1988, P MATERIALS RES S, V101, P411

[6] BORN E, 1980, PRINCIPLES OPTICS, P186

[7] BRANNON J, 1988, P MATERIALS RES SOC, V101, P27

[8] BRANNON J, UNPUB

[9] GLASS ETCHING INITIATED BY EXCIMER LASER PHOTOLYSIS OF CF2BR2 [J]. JOURNAL OF PHYSICAL CHEMISTRY, 1986, 90 (09) : 1784 - 1789

[10] EXCIMER LASER ETCHING OF POLYIMIDE [J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (05) : 2036 - 2043