AMORPHOUS-SILICON CARBIDE COATINGS FOR EXTREME ULTRAVIOLET OPTICS

被引：57

作者：

KORTRIGHT, JB ^{[1
]}

WINDT, DL ^{[1
]}

机构：

[1] UNIV COLORADO, CTR ASTROPHYS & SPACE ASTRON, BOULDER, CO 80309 USA

来源：

APPLIED OPTICS | 1988年 / 27卷 / 14期

关键词：

D O I：

10.1364/AO.27.002841

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：2841 / 2846

页数：6

共 12 条

[1] REFLECTANCE AND OPTICAL-CONSTANTS OF EVAPORATED OSMIUM IN VACUUM ULTRAVIOLET FROM 300 TO 2000 A
COX, JT
HASS, G
RAMSEY, JB
HUNTER, WR
[J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1973, 63 (04) : 435 - 438
[2] Henke B. L., 1981, AIP C P, V75, P340
[3] REFLECTANCE OF SILICON-CARBIDE IN THE VACUUM ULTRAVIOLET
KELLY, MM
WEST, JB
LLOYD, DE
[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1981, 14 (03) : 401 - &
[4] KORTRIGHT JB, 1988, NUCL I METHODS, V4266, P452
[5] MROWKA S, 1986, P SOC PHOTOOPT INSTR, V597, P160
[6] OSANTOWSKI J, 1985, APR GLANC INC OPT FA
[7] Palik E. D., 1985, HDB OPTICAL CONSTANT
[8] REHN V, 1976, 13TH P INT C PHYS SE, P985
[9] Windt D. L., 1986, Proceedings of the SPIE - The International Society for Optical Engineering, V689, P167, DOI 10.1117/12.936579
[10] OPTICAL-CONSTANTS FOR THIN-FILMS OF C, DIAMOND, AL, SI, AND CVD SIC FROM 24-A TO 1216-A
WINDT, DL
CASH, WC
SCOTT, M
ARENDT, P
NEWNAM, B
FISHER, RF
SWARTZLANDER, AB
TAKACS, PZ
PINNEO, JM
[J]. APPLIED OPTICS, 1988, 27 (02): : 279 - 295