PROPERTIES OF AMORPHOUS SILICON FILMS - DEPENDENCE ON DEPOSITION RATE

被引：10

作者：

BAHL, SK ^{[1
]}

BHAGAT, SM ^{[1
]}

GLOSSER, R ^{[1
]}

机构：

[1] UNIV MARYLAND,DEPT PHYS & ASTRON,COLLEGE PK,MD 20742

来源：

关键词：

D O I：

10.1016/0038-1098(73)90554-1

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

页码：1159 / 1163

页数：5

共 20 条

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