A REVIEW OF SOME RECENT VACUUM STUDIES (RELATED TO PUMPS AND ION BEAM SPUTTERING SYSTEMS)

被引：17

作者：

HOLLAND, L

机构：

来源：

关键词：

D O I：

10.1016/S0042-207X(70)80129-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：175 / +

页数：1

共 77 条

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ABRAHAMS, MS
BUIOCCHI, CJ
COUTTS, MD
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1968, 39 (12) : 1944 - &
[2] SPUTTERING OF DIELECTRICS BY HIGH-FREQUENCY FIELDS
ANDERSON, GS
MAYER, WN
WEHNER, GK
[J]. JOURNAL OF APPLIED PHYSICS, 1962, 33 (10) : 2991 - &
[3] ANDREW D, 1968, 4 P INT VAC C, P325
[4] ANDREW D, 1968, 4TH P INT VAC C, P337
[5] ANDREWS D, 1969, BRIT J APPL PHYS, V2, P1609
[6] USE OF A QUARTZ CRYSTAL MICROBALANCE FOR MEASURING VAPOUR BACKSTREAMING FROM MECHANICAL PUMPS
BAKER, M
LAURENSO.L
[J]. VACUUM, 1966, 16 (11) : 633 - &
[7] BAKER MA, 1968, VACUUM, V18, P599
[8] BAKER MA, 1968, VACUUM, V17
[9] BAKER MA, 1968, 4 P INT VAC C, P295
[10] BAKER MA, 1969, TECHNOL ULTRAVIDE BA, P119