PSG MASKS FOR DIFFUSIONS IN GALLIUM-ARSENIDE

[1] BALIGA BJ, 1971, THESIS RENSSELAER PO

[2] ELDRIDGE JM, 1968, T METALL SOC AIME, V242, P539

[3] FLATLEY D, 1964, J ELECTROCHEM SOC, V111, pC61

[4] GOLDSMITH N, 1967, RCA REV, V28, P153

[5] USE OF LOW-TEMPERATURE DEPOSITED SILICON DIOXIDE FILMS AS DIFFUSION MASKS IN GAAS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1964, 111 (01) : 120 - 122

[6] THERMAL OXIDATION OF GAAS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (08) : 733 - 733

[7] MUNCH WV, 1966, IBM J RES DEV, V10, P438

[8] SCHLACTER MM, 1970, IEEE T, VED17, P1077

[9] CONVERSION OF GAAS TO GAP BY SOLID-STATE DIFFUSION [J]. JOURNAL OF APPLIED PHYSICS, 1962, 33 (09) : 2795 - &

[10] THE SYSTEM SIO2-P2O5 [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1962, 45 (09) : 422 - 424

[1] BALIGA BJ, 1971, THESIS RENSSELAER PO

[2] ELDRIDGE JM, 1968, T METALL SOC AIME, V242, P539

[3] FLATLEY D, 1964, J ELECTROCHEM SOC, V111, pC61

[4] GOLDSMITH N, 1967, RCA REV, V28, P153

[5] USE OF LOW-TEMPERATURE DEPOSITED SILICON DIOXIDE FILMS AS DIFFUSION MASKS IN GAAS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1964, 111 (01) : 120 - 122

[6] THERMAL OXIDATION OF GAAS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (08) : 733 - 733

[7] MUNCH WV, 1966, IBM J RES DEV, V10, P438

[8] SCHLACTER MM, 1970, IEEE T, VED17, P1077

[9] CONVERSION OF GAAS TO GAP BY SOLID-STATE DIFFUSION [J]. JOURNAL OF APPLIED PHYSICS, 1962, 33 (09) : 2795 - &

[10] THE SYSTEM SIO2-P2O5 [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1962, 45 (09) : 422 - 424