OPTICAL-PROPERTIES OF ZNO THIN-FILMS DEPOSITED BY DC REACTIVE MAGNETRON SPUTTERING

被引：16

作者：

MENG, LJ

ANDRITSCHKY, M

DOSSANTOS, MP

机构：

[1] Physics Department, University of Minho

来源：

VACUUM | 1993年 / 44卷 / 02期

关键词：

D O I：

10.1016/0042-207X(93)90357-G

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Zinc oxide films have been deposited on glass substrates by dc reactive magnetron sputtering from a metal zinc target. Thin films obtained by this deposition method are strongly textured with c-axis, crystal direction (002), normal to the substrate surface. A detailed investigation has been made on the influence of oxygen partial pressure and sputtering current on the linear optical properties of ZnO thin films. By optimizing these two parameters ZnO coatings may have a refractive index n close to single crystal data.

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页码：105 / 109

页数：5

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