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ATOM-PROBE ANALYSIS OF A NANOCRYSTALLINE FE-C-TA SPUTTERED SOFT MAGNETIC THIN-FILM

被引：13
作者：
HONO, K
HASEGAWA, N
BABU, SS
FUJIMORI, H
SAKURAI, T
机构：
[1] Institute for Materials Research, Tohoku University, Sendai
来源：
APPLIED SURFACE SCIENCE | 1993年 / 67卷 / 1-4期
关键词：
D O I：
10.1016/0169-4332(93)90343-A
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Sputtered Fe-10.3at%C-8.3at%Ta magnetic thin films annealed below 650-degrees-C were analyzed by the atom probe method in order to elucidate the mechanism of formation of the nanocrystalline structure. In the as-deposited amorphous film, evidence for significant variation of the carbon concentration was found. By annealing below the crystallization temperature, the degree of fluctuation of the carbon concentration appeared to be enhanced. After heat treatment for optimum soft magnetic properties, TaC was observed. In this condition, substantial amounts of supersaturated C and Ta were still dissolved in the alpha-Fe phase.
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页码：391 / 397
页数：7
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