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INK JET PRINTING NOZZLE ARRAYS ETCHED IN SILICON
被引:87
作者
:
BASSOUS, E
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
BASSOUS, E
[
1
]
TAUB, HH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
TAUB, HH
[
1
]
KUHN, L
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
KUHN, L
[
1
]
机构
:
[1]
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源
:
APPLIED PHYSICS LETTERS
|
1977年
/ 31卷
/ 02期
关键词
:
D O I
:
10.1063/1.89587
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:135 / 137
页数:3
相关论文
共 7 条
[1]
A WATER-AMINE-COMPLEXING AGENT SYSTEM FOR ETCHING SILICON
FINNE, RM
论文数:
0
引用数:
0
h-index:
0
FINNE, RM
KLEIN, DL
论文数:
0
引用数:
0
h-index:
0
KLEIN, DL
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1967,
114
(09)
: 965
-
&
[2]
INK JET PRINTING
KAMPHOEFNER, FJ
论文数:
0
引用数:
0
h-index:
0
KAMPHOEFNER, FJ
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1972,
ED19
(04)
: 584
-
+
[3]
ANISOTROPIC ETCHING OF SILICON
LEE, DB
论文数:
0
引用数:
0
h-index:
0
机构:
Semiconductor Laboratories, General Electric Company Limited, Hirst Research Centre, Wembley
LEE, DB
[J].
JOURNAL OF APPLIED PHYSICS,
1969,
40
(11)
: 4569
-
&
[4]
McCarthy M. J., 1974, Chemical Engineering Journal, V7, P1, DOI 10.1016/0300-9467(74)80021-3
[5]
STABILITY OF AN ELECTRIFIED LIQUID JET
SCHNEIDER, JM
论文数:
0
引用数:
0
h-index:
0
SCHNEIDER, JM
LINDBLAD, NR
论文数:
0
引用数:
0
h-index:
0
LINDBLAD, NR
HENDRICKS, CD
论文数:
0
引用数:
0
h-index:
0
HENDRICKS, CD
CROWLEY, JM
论文数:
0
引用数:
0
h-index:
0
CROWLEY, JM
[J].
JOURNAL OF APPLIED PHYSICS,
1967,
38
(06)
: 2599
-
+
[6]
HIGH FREQUENCY RECORDING WITH ELECTROSTATICALLY DEFLECTED INK JETS
SWEET, RG
论文数:
0
引用数:
0
h-index:
0
SWEET, RG
[J].
REVIEW OF SCIENTIFIC INSTRUMENTS,
1965,
36
(02)
: 131
-
&
[7]
1976, PHYSICS TODAY JAN
←
1
→
共 7 条
[1]
A WATER-AMINE-COMPLEXING AGENT SYSTEM FOR ETCHING SILICON
FINNE, RM
论文数:
0
引用数:
0
h-index:
0
FINNE, RM
KLEIN, DL
论文数:
0
引用数:
0
h-index:
0
KLEIN, DL
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1967,
114
(09)
: 965
-
&
[2]
INK JET PRINTING
KAMPHOEFNER, FJ
论文数:
0
引用数:
0
h-index:
0
KAMPHOEFNER, FJ
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1972,
ED19
(04)
: 584
-
+
[3]
ANISOTROPIC ETCHING OF SILICON
LEE, DB
论文数:
0
引用数:
0
h-index:
0
机构:
Semiconductor Laboratories, General Electric Company Limited, Hirst Research Centre, Wembley
LEE, DB
[J].
JOURNAL OF APPLIED PHYSICS,
1969,
40
(11)
: 4569
-
&
[4]
McCarthy M. J., 1974, Chemical Engineering Journal, V7, P1, DOI 10.1016/0300-9467(74)80021-3
[5]
STABILITY OF AN ELECTRIFIED LIQUID JET
SCHNEIDER, JM
论文数:
0
引用数:
0
h-index:
0
SCHNEIDER, JM
LINDBLAD, NR
论文数:
0
引用数:
0
h-index:
0
LINDBLAD, NR
HENDRICKS, CD
论文数:
0
引用数:
0
h-index:
0
HENDRICKS, CD
CROWLEY, JM
论文数:
0
引用数:
0
h-index:
0
CROWLEY, JM
[J].
JOURNAL OF APPLIED PHYSICS,
1967,
38
(06)
: 2599
-
+
[6]
HIGH FREQUENCY RECORDING WITH ELECTROSTATICALLY DEFLECTED INK JETS
SWEET, RG
论文数:
0
引用数:
0
h-index:
0
SWEET, RG
[J].
REVIEW OF SCIENTIFIC INSTRUMENTS,
1965,
36
(02)
: 131
-
&
[7]
1976, PHYSICS TODAY JAN
←
1
→