EFFECT OF DISTRIBUTED-GATE CONTROL ON CURRENT FILAMENTATION IN THYRISTORS

被引:18
作者
GORBATYUK, AV
RODIN, PB
机构
[1] A. F. Ioffe Institute, Leningrad
关键词
D O I
10.1016/0038-1101(92)90172-9
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Spontaneous current filamentation in a thyristor with a planar distributed gate is described. The parameters of the filaments are assumed to depend on gate potential and have been estimated taking into account 2-D transport phenomena in the semiconductor structure. The theory permits systematic analysis of various controlled switching regimes of the device.
引用
收藏
页码:1359 / 1364
页数:6
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