REACTIVE MAGNETRON SPUTTERING OF ZNO

被引:57
作者
KHURIYAKUB, BT [1 ]
SMITS, JG [1 ]
BARBEE, T [1 ]
机构
[1] STANFORD UNIV,CTR MAT RES,STANFORD,CA 94305
关键词
D O I
10.1063/1.329315
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:4772 / 4774
页数:3
相关论文
共 7 条
[1]  
BAHR AJ, 1979, P IEEE SONICS ULTRAS, P199
[2]   BROAD-BAND EFFICIENT THIN-FILM SEZAWA WAVE INTERDIGITAL TRANSDUCERS [J].
BOWERS, JE ;
KHURIYAKUB, BT ;
KINO, GS .
APPLIED PHYSICS LETTERS, 1980, 36 (10) :806-807
[3]  
GREEN JB, 1979, P IEEE SONICS ULTRAS, P911
[4]  
HATA T, 1979, P IEEE ULTR, P936
[5]   STRUCTURE AND PROPERTIES OF VACUUM-DEPOSITED THIN-FILMS - NEW BASIC RELATIONSHIP [J].
VINCETT, PS ;
BARLOW, WA ;
ROBERTS, GG .
JOURNAL OF APPLIED PHYSICS, 1977, 48 (09) :3800-3806
[6]  
Vossen J.L., 1978, THIN FILM PROCESSES
[7]   CHARACTERIZATION OF ZNO PIEZOELECTRIC FILMS PREPARED BY RF PLANAR-MAGNETRON SPUTTERING [J].
YAMAMOTO, T ;
SHIOSAKI, T ;
KAWABATA, A .
JOURNAL OF APPLIED PHYSICS, 1980, 51 (06) :3113-3120