EXTREME-ULTRAVIOLET INTERFEROMETRY AT 15.5 NM USING MULTILAYER OPTICS

被引：15

作者：

DASILVA, LB

BARBEE, TW

CAUBLE, R

CELLIERS, P

CIARLO, D

MORENO, JC

MROWKA, S

TREBES, JE

WAN, AS

WEBER, F

机构：

[1] Lawrence Livermore National Laboratory, Livermore, CA, 94550, M/S L-447

来源：

APPLIED OPTICS | 1995年 / 34卷 / 28期

关键词：

D O I：

10.1364/AO.34.006389

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The development of multilayer mirror technology capable of operating in the range of 3-30 nm and the construction of thin membranes with excellent uniformity and strength have made it possible to design and implement a Mach-Zehnder interferometer operating at 15.5 nm. We have tested this interferometer by using a soft x-ray laser as a source, and we show its use in probing high-density plasmas.

引用

收藏

页码：6389 / 6392

页数：4

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