THICKNESS DEPENDENCE OF THE ELECTRONIC-STRUCTURE OF ULTRATHIN, EPITAXIAL NI(111)/W(110) LAYERS

被引：50

作者：

KAMPER, KP

SCHMITT, W

GUNTHERODT, G

KUHLENBECK, H

机构：

[1] UNIV COLOGNE,INST PHYS 2,D-5000 COLOGNE 41,FED REP GER

[2] UNIV OSNABRUCK,FACHBEREICH PHYS,D-4500 OSNABRUCK,FED REP GER

来源：

PHYSICAL REVIEW B | 1988年 / 38卷 / 14期

关键词：

D O I：

10.1103/PhysRevB.38.9451

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：9451 / 9456

页数：6

共 17 条

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VANDERMERWE, JH
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