DIODE EDGE EFFECT ON DOPING-PROFILE MEASUREMENTS

被引:58
作者
COPELAND, JA
机构
关键词
D O I
10.1109/T-ED.1970.16996
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:404 / &
相关论文
共 7 条
[1]  
COPELAND JA, 1969, IEEE T ELECTRON DEVI, VED16, P445
[3]  
HILDEBRAND J, 1960, RCA REV
[4]   ON MEASUREMENT OF IMPURITY ATOM DISTRIBUTIONS IN SILICON BY DIFFERENTIAL CAPACITANCE TECHNIQUE [J].
KENNEDY, DP ;
MURLEY, PC ;
KLEINFELDER, W .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1968, 12 (05) :399-+
[5]  
MCKENNA J, 1970, BELL SYS TECH J
[6]  
SPIWAK RR, 1969, IEEE T, VIM18, P197
[7]   EFFECT OF JUNCTION CURVATURE ON BREAKDOWN VOLTAGE IN SEMICONDUCTORS [J].
SZE, SM ;
GIBBONS, G .
SOLID-STATE ELECTRONICS, 1966, 9 (09) :831-&