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FILM-INDUCED STRESS MODEL
被引:12
作者
:
HEARN, EW
论文数:
0
引用数:
0
h-index:
0
HEARN, EW
WERNER, DJ
论文数:
0
引用数:
0
h-index:
0
WERNER, DJ
DONEY, DA
论文数:
0
引用数:
0
h-index:
0
DONEY, DA
机构
:
来源
:
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
1986年
/ 133卷
/ 08期
关键词
:
D O I
:
10.1149/1.2109008
中图分类号
:
O646 [电化学、电解、磁化学];
学科分类号
:
081704 ;
摘要
:
引用
收藏
页码:1749 / 1751
页数:3
相关论文
共 6 条
[1]
CALCULATED ELASTIC-CONSTANTS FOR STRESS PROBLEMS ASSOCIATED WITH SEMICONDUCTOR DEVICES
BRANTLEY, WA
论文数:
0
引用数:
0
h-index:
0
机构:
BELL LABS, MURRAY HILL, NJ 07974 USA
BELL LABS, MURRAY HILL, NJ 07974 USA
BRANTLEY, WA
[J].
JOURNAL OF APPLIED PHYSICS,
1973,
44
(01)
: 534
-
535
[2]
Chopra K.L, 1969, THIN FILM PHENOMENA
[3]
HEARN EW, 1977, ADV XRAY ANAL, V20, P273
[4]
HOFFMAN RW, 1973, PHYSICS THIN FILMS, V3
[5]
LEROY B, 1983, THESIS U PARIS PARIS
[6]
MAISSEL LI, 1973, INTRO THIN FILMS
←
1
→
共 6 条
[1]
CALCULATED ELASTIC-CONSTANTS FOR STRESS PROBLEMS ASSOCIATED WITH SEMICONDUCTOR DEVICES
BRANTLEY, WA
论文数:
0
引用数:
0
h-index:
0
机构:
BELL LABS, MURRAY HILL, NJ 07974 USA
BELL LABS, MURRAY HILL, NJ 07974 USA
BRANTLEY, WA
[J].
JOURNAL OF APPLIED PHYSICS,
1973,
44
(01)
: 534
-
535
[2]
Chopra K.L, 1969, THIN FILM PHENOMENA
[3]
HEARN EW, 1977, ADV XRAY ANAL, V20, P273
[4]
HOFFMAN RW, 1973, PHYSICS THIN FILMS, V3
[5]
LEROY B, 1983, THESIS U PARIS PARIS
[6]
MAISSEL LI, 1973, INTRO THIN FILMS
←
1
→