DESIGN AND MANUFACTURE OF SPUTTERED MULTILAYERS FOR APPLICATIONS TO SOFT-X-RAY OPTICS

被引：2

作者：

HOUDY, P

BOHER, P

机构：

来源：

JOURNAL DE PHYSIQUE III | 1994年 / 4卷 / 09期

关键词：

D O I：

10.1051/jp3:1994226

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Nanometer scale multilayers has been deposited using high vacuum diode rf sputtering chamber equipped with in situ kinetic ellipsometers. The influence of the composition, the roughness, the interface layer and the number of periods have been studied in order to optimize the stacks for soft X-ray reflection. The behaviour of the structures under thermal annealing has been observed. At last, gratings have been successfully manufactured.

引用

页码：1589 / 1598

页数：10

共 13 条

[1] ASPNES D, 1983, J PHYS C SOLID STATE, V44, P610
[2] FABRICATION AND TESTS OF MULTILAYER GRATINGS FOR THE SOFT-X-RAY REGION
BAC, S
TROUSSEL, P
MALEK, CK
BOHER, P
GUERIN, P
LADAN, FR
HOUDY, P
SCHIRMANN, D
BARCHEWITZ, R
[J]. JOURNAL OF OPTICS-NOUVELLE REVUE D OPTIQUE, 1993, 24 (02): : 88 - 96
[3] Barbee TW, 1985, P SPIE, V563, P2, DOI [10.1117/12.949647, DOI 10.1117/12.949647]
[4] BOHER P, 1991, SPIE, V3, P1049
[5] BOHER P, 1992, SPIE P, V1742, P331
[6] BOHER P, 1991, OPT ENG, V3, P1049
[7] BOHER P, 1990, SPIE, V1345, P198
[8] FERNANDEZ FE, 1985, SPIE, V563, P195
[9] KINETIC ELLIPSOMETRY APPLIED TO SOFT-X-RAY MULTILAYER GROWTH-CONTROL
HOUDY, P
[J]. REVUE DE PHYSIQUE APPLIQUEE, 1988, 23 (10): : 1653 - 1659
[10] HOUDY P, 1990, MET MULTILAYERS T TE, V59, P581

← 1 2 →