ESTABLISHMENT OF A RADIATION HARDENED CMOS MANUFACTURING PROCESS

被引:8
作者
LONDON, A
MATTEUCCI, DA
WANG, RC
机构
关键词
D O I
10.1109/TNS.1977.4329164
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:2056 / 2059
页数:4
相关论文
共 2 条
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DAWES, WR ;
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IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1976, 11 (04) :459-465
[2]   EFFECTS OF IONIZING RADIATION ON OXIDIZED SILICON SURFACES AND PLANAR DEVICES [J].
SNOW, EH ;
GROVE, AS ;
FITZGERALD, DJ .
PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1967, 55 (07) :1168-+