EXPOSURE OF PHOTORESISTS .2. ELECTRON AND LIGHT EXPOSURE OF A POSITIVE PHOTORESIST

被引：24

作者：

BROYDE, B

机构：

来源：

关键词：

D O I：

10.1149/1.2407382

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1555 / &

共 7 条

[1] EXPOSURE OF PHOTORESISTS - ELECTRON BEAM EXPOSURE OF NEGATIVE PHOTORESISTS
BROYDE, B
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (09) : 1241 - &
[2] HARWOOD MG, AD846184
[3] ELECTRON RESISTS FOR MICROCIRCUIT AND MASK PRODUCTION
HATZAKIS, M
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (07) : 1033 - &
[4] HTOO MS, 1968, PHOTOGR SCI ENG, V12, P169
[5] LEVINE HA, 1967, AM CHEM SOC, V10, P337
[6] MATTA RK, 1967, ELECTROCHEM TECHNOL, V5, P382
[7] MUSTAFA A, 1964, ADV PHOTOCHEM, V2, P113