IMPACT OF SILICIDATION ON THE EXCESS NOISE BEHAVIOR OF MOS-TRANSISTORS

被引:45
作者
VANDAMME, EP
VANDAMME, LKJ
CLAEYS, C
SIMOEN, E
SCHREUTELKAMP, RJ
机构
[1] IMEC vzw, 3001 Heverlee
关键词
D O I
10.1016/0038-1101(95)00011-H
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The excess noise behaviour of silicided and non-silicided p- and n-channel MOSTs, biased in the ohmic region, has been investigated. Only a minor difference in noise and series resistance could be seen for the n-channel MOSTs. However, the noise in the non-silicided p-MOSTs was dominated by the noise in the series resistance. The series resistance for the non-silicided p-MOSTs was more than four times higher than for the silicided p-MOSTs. A modified model for the 1/f noise equivalent circuit is proposed, showing good agreement with experimental results and explaining the observed trend S(ld)proportional to I-d(m) with 0 < m < 4. The classical geometry dependence of the current noise in MOSTs is only valid if the noise in the series resistance is negligible.
引用
收藏
页码:1893 / 1897
页数:5
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