AU/N-ZNSE CONTACTS STUDIED WITH USE OF BALLISTIC-ELECTRON-EMISSION MICROSCOPY

被引:23
作者
CORATGER, R
AJUSTRON, F
BEAUVILLAIN, J
DHARMADASA, IM
BLOMFIELD, CJ
PRIOR, KA
SIMPSON, J
CAVENETT, BC
机构
[1] SHEFFIELD HALLAM UNIV,MAT RES INST,SHEFFIELD S1 1WB,S YORKSHIRE,ENGLAND
[2] HERIOT WATT UNIV,DEPT PHYS,EDINBURGH EH14 4AS,MIDLOTHIAN,SCOTLAND
来源
PHYSICAL REVIEW B | 1995年 / 51卷 / 04期
关键词
D O I
10.1103/PhysRevB.51.2357
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Ballistic-electron-emission microscopy (BEEM) has been used to study the Schottky-barrier formation at the Au/n-ZnSe interface. Spectroscopy measurements indicate that the Schottky-barrier heights present unusually large variations and range from 1.53 to 2.15 eV. The lowest values are in good agreement with the barrier heights obtained from macroscopic current-voltage (I-V) measurements. The possible reasons for the existence of large Schottky-barrier variations are presented and discussed in this paper. These include the effect of variations of the work function and the behavior of the contact as a metal-insulator- semiconductor structure due to microclusters of different phases at the interface. Contrasts in the BEEM image are also found to follow the gold grain boundaries and are assumed to depend both on the grain orientation and interface quality. © 1995 The American Physical Society.
引用
收藏
页码:2357 / 2362
页数:6
相关论文
共 31 条
[1]   OBSERVATION OF INTERFACE BAND-STRUCTURE BY BALLISTIC-ELECTRON-EMISSION MICROSCOPY [J].
BELL, LD ;
KAISER, WJ .
PHYSICAL REVIEW LETTERS, 1988, 61 (20) :2368-2371
[2]  
BELL LD, 1988, SCANNING MICROSCOPY, V2, P1231
[3]   TUNNELING THROUGH A CONTROLLABLE VACUUM GAP [J].
BINNIG, G ;
ROHRER, H ;
GERBER, C ;
WEIBEL, E .
APPLIED PHYSICS LETTERS, 1982, 40 (02) :178-180
[4]   CHARACTERIZATION OF THE METAL-SEMICONDUCTOR INTERFACE BY BALLISTIC-ELECTRON-EMISSION MICROSCOPY [J].
CORATGER, R ;
AJUSTRON, F ;
BEAUVILLAIN, J .
MICROSCOPY MICROANALYSIS MICROSTRUCTURES, 1994, 5 (01) :31-40
[5]  
CORATGER R, 1993, J PHYS III, V3, P2211, DOI 10.1051/jp3:1993270
[6]   A STAGE FOR SUBMICRON DISPLACEMENTS USING ELECTROMAGNETIC COILS AND ITS APPLICATION TO SCANNING TUNNELING MICROSCOPY [J].
CORATGER, R ;
BEAUVILLAIN, J ;
AJUSTRON, F ;
LACAZE, JC ;
TREMOLLIERES, C .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1991, 62 (03) :830-831
[7]   EFFECTS OF SURFACE TREATMENTS ON SCHOTTKY-BARRIER FORMATION AT METAL NORMAL-TYPE CDTE CONTACTS [J].
DHARMADASA, IM ;
THORNTON, JM ;
WILLIAMS, RH .
APPLIED PHYSICS LETTERS, 1989, 54 (02) :137-139
[8]  
DHARMADASA IM, IN PRESS SURF INTER
[9]   THE AU/CDTE INTERFACE - AN INVESTIGATION OF ELECTRICAL BARRIERS BY BALLISTIC ELECTRON-EMISSION MICROSCOPY [J].
FOWELL, AE ;
WILLIAMS, RH ;
RICHARDSON, BE ;
SHEN, TH .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1990, 5 (04) :348-350
[10]   SCHOTTKY BARRIERS - AN EFFECTIVE WORK FUNCTION MODEL [J].
FREEOUF, JL ;
WOODALL, JM .
APPLIED PHYSICS LETTERS, 1981, 39 (09) :727-729