MICROSTRUCTURE OF Y2O3 FLUXED HOT-PRESSED SILICON-NITRIDE

被引:98
作者
CLARKE, DR
THOMAS, G
机构
[1] UNIV CALIF BERKELEY,LAWRENCE BERKELEY LAB,COLL ENGN,DEPT MAT SCI & MINERAL ENGN,BERKELEY,CA 94720
[2] UNIV CALIF BERKELEY,LAWRENCE BERKELEY LAB,DIV MAT & MOLEC RES,BERKELEY,CA 94720
关键词
D O I
10.1111/j.1151-2916.1978.tb09251.x
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:114 / 118
页数:5
相关论文
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