DEPOSITION OF NONSTOICHIOMETRIC TIC AT HIGH-TEMPERATURE

被引：7

作者：

TEYSSANDIER, F ^{[1
]}

BERNARD, C ^{[1
]}

DUCARRIOR, M ^{[1
]}

机构：

[1] THERMODYNAM & PHYS CHIM MET LAB,F-38402 ST MARTIN DHERES,FRANCE

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 01期

关键词：

D O I：

10.1149/1.2095560

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：225 / 229

页数：5

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